Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces

Siti Kudnie, Sahari and Muhammad, Kashif and Marini, Sawawi and Nik Amni Fathi, Nik Zaini Fathi and Azrul Azlan, Hamzah and Burhanuddin, Yeop Majlis and Norsuzailina, Mohamed Sutan and Rohana, Sapawi and Kuryati, Kipli and Marini, Sawawi and Nurul Atiqah, Abdul Halim and Nazreen, Junaidi and Sharifah Masniah, Wan Masra (2017) Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces. MATEC Web of Conferences, 87. ISSN 2261236X

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Abstract

The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after treated with HCl cleaning on two surface orientations; (100) and (111), respectively in dry oxygen ambient and cleanroom air by spectroscopic ellipsometry (SE) and x-ray photoelectron spectroscopy (XPS). A clear step and terrace trend was observed for the oxidation growth of Ge (100) and Ge (111) in dry oxygen ambient compared to in clean room air. This trend shows the difference in surface reaction of Ge oxidation as humidity varies. The stability of chlorine termination of Ge (111) than Ge (100) explains the slower growth of oxidation in dry oxygen ambient.

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